Search results for “Scratch marks” companies
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Key Players
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Innovation Intensity
With the analysis among 1,234 patents, we discovered top 477 key players by total patent application. Ricoh Co., Ltd., Dai Nippon Printing Co., Ltd., Hitachi Ltd. are dominant in this area. They take 6.97% of the total patent filing.
Ricoh Co., Ltd.
Tokyo-to, Japan
Patent: 26
Dai Nippon Printing Co., Ltd.
Tokyo-to, Japan
Patent: 26
Hitachi Ltd.
Tokyo-to, Japan
Patent: 22
Toppan, Inc.
Tokyo-to, Japan
Patent: 20
FUJIFILM Corp.
Tokyo-to, Japan
Patent: 20
Fuji Photo Film Co., Ltd.
Tokyo-to, Japan
Patent: 17
Konica Corp.
Japan
Patent: 17
Hitachi High-Tech America, Inc.
Illinois, United States
Patent: 16
Corning, Inc.
New York, United States
Patent: 16
Natoco Co., Ltd.
Aichi-ken, Japan
Patent: 13
Startups & Unicorns
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Innovation Intensity
With the analysis among 3 patents, we discovered top 3 start-ups by total patent application.
STARTUP
Massachusetts Materials Technologies LLC
Massachusetts, United States
Patent: 1
STARTUP
Aisin KK
Tokyo-to, Japan
Patent: 1
STARTUP
Cathay Photonics Ltd.
Hong Kong SAR, China
Patent: 1
Fast-Growing
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Innovation in recent 5 years
With the analysis among related 230 patents applied in the last 5 years. We discover 167 most active companies in this area. The fast-growing Beijing NAURA Microelectronics Equipment Co., Ltd., Civil Aviation University of China, Hebe Studio Ltd. take 3.48% of patent filing during this period.
Beijing NAURA Microelectronics Equipment Co., Ltd.
Beijing Shi, China
Patent: 3
Civil Aviation University of China
Tianjin Shi, China
Patent: 3
Hebe Studio Ltd.
United Kingdom
Patent: 2
Tianjin University
Tianjin Shi, China
Patent: 2
Chengdu Aircraft Industrial Group Co. Ltd.
Sichuan Sheng, China
Patent: 2
Taiwan Semiconductor Manufacturing Co., Ltd.
Taiwan Province, China
Patent: 2
Dalian University of Technology
Liaoning Sheng, China
Patent: 2
RedLux Ltd.
Hampshire, United Kingdom
Patent: 2
Mitsubishi Cable Industries Ltd.
Tokyo-to, Japan
Patent: 2
Tianjin Boyuan New Materials Co. Ltd.
Tianjin Shi, China
Patent: 2
New Entrants
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Innovation in recent 5 years
With the analysis among related 230 patents in last 5 years, we discover 148 new entrants. Beijing NAURA Microelectronics Equipment Co., Ltd., Civil Aviation University of China, Hebe Studio Ltd. are the most active new entrants in this area.
Beijing NAURA Microelectronics Equipment Co., Ltd.
Beijing Shi, China
Patent: 3
Civil Aviation University of China
Tianjin Shi, China
Patent: 3
Hebe Studio Ltd.
United Kingdom
Patent: 2
Tianjin University
Tianjin Shi, China
Patent: 2
Chengdu Aircraft Industrial Group Co. Ltd.
Sichuan Sheng, China
Patent: 2
Mitsubishi Cable Industries Ltd.
Tokyo-to, Japan
Patent: 2
Tianjin Boyuan New Materials Co. Ltd.
Tianjin Shi, China
Patent: 2
Changchun Institute of Technology
Jilin Sheng, China
Patent: 2
CKD Corp.
Aichi-ken, Japan
Patent: 2
The First Affiliated Hospital of Soochow University
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Patent: 2
Research Institutions
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Innovation Intensity
With the analysis among 99 patents, we discovered top 40 universities and scientific research institutions by total patent application. Civil Aviation University of China, Jilin University, Shanghai Jiao Tong University are dominant in this area. They take 21.21% of the total patent filing.
Civil Aviation University of China
Tianjin Shi, China
Patent: 3
Jilin University
Jilin Sheng, China
Patent: 2
Shanghai Jiao Tong University
Shanghai Shi, China
Patent: 2
Sichuan University
Sichuan Sheng, China
Patent: 2
L'Universite de Haute Alsace
France
Patent: 2
University of Science & Technology Beijing
Beijing Shi, China
Patent: 2
Ulsan National Institute of Science & Technology
South Korea
Patent: 2
Hebei University of Technology
Hebei Sheng, China
Patent: 2
Changchun Institute of Technology
Jilin Sheng, China
Patent: 2
Tianjin University
Tianjin Shi, China
Patent: 2
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